Photoresist Developer: Positive Photoresist Developer is hydrated alkaline material which dissolves readily in water, giving a buffered alkaline solution for economical development of novalak polymer films used in micro imaging. Photoresist Developer will provide flat trace sidewalls consistently over its useful life, and should be used in automated spray equipment, preferably with pH controlled additions. This Chemical is the most critical in image formation quality and should be replentished and monitored regularly. This developer is capable of absorbing CO2 from the air and thus lowering its pH. A Nitrogen blanket or a floating lid is recommended to minimize exposure to air to maintain its effectiveness with tank processing; fresh developer is recommended to be used with spray systems.