Iron Oxide Photoplates

Iron Oxide Photoplates: Hard surface iron oxide photomask material for making durable high resolution photomasks and photolithography uses. The greatest value of this material is that it has opacity to Ultraviolet Light which is used in most photolithograhpy processes, while passing many wavelengths of the visible spectrum for ease of alignment to the wafer or other substrates. The iron oxide is an orange vacuum deposited film on to various sizes and types of glass substrates for mask making purposes.